Methyl Fluoride/HFC-41
Methyl Fluoride (CH3F) is an environmentally friendly dry etching gas with low GWP, showing very high performance in etching process of semiconductor and electronic products.
Product Description
|
Items |
Specification |
|
Chemical Name |
Methyl Fluoride, Freon 41, HFC-41, R-41 |
|
Chemical formula |
CH3-F |
|
Molecular formula |
CH3F |
|
CAS No. |
593-53-3 |
|
Molecular weight (g/mol) |
34.03 |
|
ODP |
0 |
|
GWP100 yr |
150 |
Physical & Chemical properties
|
Attributes |
Values |
|
Chemical Name |
Methyl Fluoride, Freon 41, HFC-41, R-41 |
|
Boiling point (℃) |
-78.4 |
|
Freezing point (℃) |
-142 |
|
Critical temperature (℃) |
44.5 |
|
Relative gas density (air = 1) |
1.2 |
|
Relative liquid density (water = 1) |
0.61 |
|
Vapor pressure (kPa, @21℃) |
3300 |
|
Explosion limits (%vol) |
2.6-21.7 |
Packaging Information: 4.64L/10.2L/44L Cylinder