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Hexafluoro-1,3-butadiene/C4F6

Hexafluoro-1,3-butadiene (C4F6) is an environmentally friendly dry etching gas with low GWP, high etching rate, high selectivity and high aspect ratio, showing very high performance for critical plasma etching in semiconductor devices manufacturing.

Product Description

Items

Specification

Chemical Name

Hexafluoro-1,3-butadiene, Perfluorobutadiene

Chemical formula

CF2=CF-CF=CF2

Molecular formula

C4F6

CAS NO.

685-63-2

Molecular weight (g/mol)

162.03

ODP

0

GWP100 yr

<1

Atmospheric lifetime (days)

1.1

 

Physical & Chemical Properties

Attributes

Values

Chemical Name

Hexafluoro-1,3-butadiene, Perfluorobutadiene

Boiling point (℃)

-6.5

Freezing point (℃)

-130

Critical temperature (℃)

139.6

Critical pressure (bar)

31.9

Liquid density (kg/l, @15℃)

1.44

Vapor density (kg/m3, @15℃)

6.8

Vapor pressure (bar, @25℃)

2.11

Heat of vaporization (kJ/kg,@b.p.)

161.8

Explosion limits (%vol)

7-73

Packaging Information: 4.64L/10.2L/44L Cylinder