Hexafluoro-1,3-butadiene/C4F6
Hexafluoro-1,3-butadiene (C4F6) is an environmentally friendly dry etching gas with low GWP, high etching rate, high selectivity and high aspect ratio, showing very high performance for critical plasma etching in semiconductor devices manufacturing.
Product Description
|
Items |
Specification |
|
Chemical Name |
Hexafluoro-1,3-butadiene, Perfluorobutadiene |
|
Chemical formula |
CF2=CF-CF=CF2 |
|
Molecular formula |
C4F6 |
|
CAS NO. |
685-63-2 |
|
Molecular weight (g/mol) |
162.03 |
|
ODP |
0 |
|
GWP100 yr |
<1 |
|
Atmospheric lifetime (days) |
1.1 |
Physical & Chemical Properties
|
Attributes |
Values |
|
Chemical Name |
Hexafluoro-1,3-butadiene, Perfluorobutadiene |
|
Boiling point (℃) |
-6.5 |
|
Freezing point (℃) |
-130 |
|
Critical temperature (℃) |
139.6 |
|
Critical pressure (bar) |
31.9 |
|
Liquid density (kg/l, @15℃) |
1.44 |
|
Vapor density (kg/m3, @15℃) |
6.8 |
|
Vapor pressure (bar, @25℃) |
2.11 |
|
Heat of vaporization (kJ/kg，@b.p.) |
161.8 |
|
Explosion limits (%vol) |
7-73 |
Packaging Information: 4.64L/10.2L/44L Cylinder