1,1,1,3,3,3-Hexafluoropropane/HFC-236fa
1,1,1,3,3,3-Hexafluoropropane(HFC-236fa) is an environmentally friendly and novel dry etching gas, mainly used in front end etching process of semiconductor.
Product Description
Items |
Specification |
|
Chemical name |
1,1,1,3,3,3-Hexafluoropropane; HFC-236fa |
|
CAS No. |
690-39-1 |
|
Molecular formula |
C3H2F6 |
|
Molecular weight |
152.04 |
|
Boiling point (101.325kPa, ℃) |
-1.1 |
|
Vapor Pressure (25℃, kPa) |
260.8 |
|
Density (101.325kPa, g/cm3) |
1.371 |
Packing Specification: 4.64L/10.2L/44L Cylinder